TESCAN offers a FIB-SEM configuration where the electron and ion beam focal points align, optimizing various applications such as material science, life science, and semiconductors. There are two types of FIB-SEM systems: Gallium ions, which provide ultimate precision for fabrication and nanopatterning, and Xe plasma FIBs, which deliver high ion beam currents, allowing for the removal of large volumes of material up to 50 times faster than Ga-FIBs.